(Nanowerk News) The ability to quickly generate ultra-small, well-ordered nanopatterns over large areas on material surfaces is critical to the fabrication of next-generation technologies in many ...

A technical paper titled “Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly” was published by researchers at Tokyo Institute of Technology and Tokyo ...

A recently developed block copolymer could help push the limits of integration and miniaturization in semiconductor manufacturing, report scientists. Chemically tailored for reliable directed ...