Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are ...
Revealing another piece of its DFM tool arsenal, Synopsys Inc. today detailed its new process-aware design-for-manufacturing (PA-DFM) tools, meant to analyze variability effects at the custom/analog ...
SE: Especially with advanced nodes, there are many types of variation in the process and today’s design and verification tools have to understand this. How does variation impact the sphere of your ...
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